a.Key Laboratory of Science and Technology on High-tech Polymer Materials, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
b.Yantai Research Institute, Harbin Engineering University, Yantai 264000, China
c.Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
d.Spallation Neutron Source Science Center, Dongguan 523803, China
dgj1129@163.com (G.J.D.)
zongbo@iccas.ac.cn (Z.B.Z.)
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Rapid Conversion of Perhydropolysilazane into Thin Silica Coating at Low Temperature[J]. 高分子科学(英文版), 2023,41(8):1198-1205.
Wen-Yue Wang, Yu-Lin Zhang, Xiang Guo, et al. Rapid Conversion of Perhydropolysilazane into Thin Silica Coating at Low Temperature[J]. Chinese Journal of Polymer Science, 2023,41(8):1198-1205.
Rapid Conversion of Perhydropolysilazane into Thin Silica Coating at Low Temperature[J]. 高分子科学(英文版), 2023,41(8):1198-1205. DOI: 10.1007/s10118-023-2959-6.
Wen-Yue Wang, Yu-Lin Zhang, Xiang Guo, et al. Rapid Conversion of Perhydropolysilazane into Thin Silica Coating at Low Temperature[J]. Chinese Journal of Polymer Science, 2023,41(8):1198-1205. DOI: 10.1007/s10118-023-2959-6.
The conversion of perhydropolysilazane (PHPS) to silica at low temperature is beneficial for its application on thermally vulnerable substrates. In this work, it is demonstrated that (3-aminopropyl)triethoxysilane (APTES) has high catalytic efficiency for the low temperature conversion of PHPS and the catalytic mechanism of APTES was suggested. The influence of temperature and humidity on the catalytic conversion process was investigated, and it was found that PHPS can be rapidly converted to silica in 10 min at 80 °C with relative humidity of 90%. The achieved silica is mainly composed of SiNO,3,/SiO,3,OH and SiO,4, structure with O/Si of 1.74 and N content of 1%. As an approach to prepare inorganic coating, the low-temperature conversion method achieves a silica coating with low volume shrinkage of 0.86%, low roughness of ,R,a,=0.293 nm, high nanoindentation hardness of 3.62 GPa and modulus of 30.06 GPa, which exhibits high potentials as protective coating for various materials even those vulnerable to high temperature.
Perhydropolysilazane(3-Aminopropyl)triethoxysilaneSilica coatingRapid conversionCatalysis
Zhang,T.T.;Zhou,M.X.;Guo,Z.Y.;Zhao,Y.B.;Han,D.;Xiu,H.;Bai,H.W.;Zhang,Q.;Fu,Q.Improvingimpacttoughnessofpolylactide/ethylene-co-vinyl-acetateblendsviaaddingfumedsilicananoparticles:effectsofspecificsurfacearea-dependentinterfacialselectivedistributionofsilica.Chinese J. Polym. Sci.2021,39,1040−1049..
Khodakarami,S.;Zhao,H.Y.;Rabbi,K.F.;Miljkovic,N.Scalablecorrosion-resistantcoatingsforthermalapplications.ACS Appl. Mater. Interfaces2021,13,4519−4534..
Fan,L.L.;Quan,J.Y.;Zhang,H.;Yu,J.R.;Hu,Z.M.;Wang,Y.PreparationofhydrophilicUHMWPEhollowfibermembranesbychemicallyboundingsilicananoparticles.Chinese J. Polym. Sci.2021,39,189−200..
Monti,M.;DalBianco,B.;Bertoncello,R.;Voltolina,S.Newprotectivecoatingsforancientglass:silicathin-filmsfromperhydropolysilazane.J. Cult. Herit.2008,9,E143−E145..
Li,P.F.;Wang,D.;Zhang,Z.B.;Guo,Y.L.;Jiang,L.;Xu,C.H.Room-temperature,solution-processedSiOxviaphotochemistryapproachforhighlyflexibleresistiveswitchingmemory.ACS Appl. Mater. Interfaces2020,12,56186−56194..
Li,P.F.;Zhang,Y.L.;Guo,Y.L.;Jiang,L.;Zhang,Z.B.;Xu,C.H.Resistanceswitchingbehaviorofaperhydropolysilazane-derivedSiOx-basedmemristor.J. Phys. Chem. Lett.2021,12,10728−10734..
Back,H.S.;Kim,M.J.;Baek,J.J.;Kim,D.H.;Shin,G.;Choi,K.H.;Cho,J.H.Intense-pulsed-UV-convertedperhydropolysilazanegatedielectricsfororganicfield-effecttransistorsandlogicgates.RSC Adv.2019,9,3169−3175..
Blankenburg,L.;Schrodner,M.Perhydropolysilazanederivedsilicaforflexibletransparentbarrierfoilsusingareel-to-reelwetcoatingtechnique:single-andmultilayerstructures.Surf. Coat. Technol.2015,275,193−206..
Jin,S.B.;Long,W.;Sahu,B.B.;Han,J.G.;Hori,M.Improvingthegasbarrierandmechanicalpropertiesofa-SiOxfilmssynthesizedatlowtemperaturebyusinghighenergyandhydrogenflowratecontrol.J. Korean Phys. Soc.2015,66,1410−1415..
Channa,I.A.;Shah,A.A.;Rizwan,M.;Makhdoom,M.A.;Chandio,A.D.;Shar,M.A.;Mahmood,A.Processparameteroptimizationofapolymerderivedceramiccoatingsforproducingultra-highgasbarrier.Materials2021,14,7000..
Reichelt,K.;Jiang,X.Thepreparationofthinfilmsbyphysicalvapourdepositionmethods.Thin Solid Films1990,191,91−126..
Mattox,D.M.Physicalvapordeposition(PVD)processes.Met. Finish.2000,98,410−423..
Boke,F.;Giner,I.;Keller,A.;Grundmeier,G.;Fischer,H.Plasma-enhancedchemicalvapordeposition(PE-CVD)yieldsbetterhydrolyticalstabilityofbiocompatibleSiOxthinfilmsonimplantaluminaceramicscomparedtorapidthermalevaporationphysicalvapordeposition(PVD).ACS Appl. Mater. Interfaces2016,8,17805−17816..
Jung,H.;Kim,W.H.;Oh,I.K.;Lee,C.W.;Lansalot-Matras,C.;Lee,S.J.;Myoung,J.M.;Lee,H.B.R.;Kim,H.GrowthcharacteristicsandelectricalpropertiesofSiO2thinfilmspreparedusingplasma-enhancedatomiclayerdepositionandchemicalvapordepositionwithanaminosilaneprecursor.J. Mater. Sci.2016,51,5082−5091..
Aman,S.G.M;Koretomo,D.;Magari,Y.;Furuta,M.InfluenceofDepositionTemperatureandSourceGasinPE-CVDforSiO2PassivationonPerformanceandReliabilityofIn-Ga-Zn-OThin-FilmTransistors.IEEE Trans. Electr. Devices2018,65,3257−3263..
Arl,D.;Roge,V.;Adjeroud,N.;Pistillo,B.R.;Sarr,M.;Bahlawane,N.;Lenoble,D.SiO2thinfilmgrowththroughapureatomiclayerdepositiontechniqueatroomtemperature.RSC Adv.2020,10,18073−18081..
Matsuo,H.;Yamada,K.Topicsoncoating.Ceramiccoatingcapablelow-temperatureformationusinginorganicpolysilazane.Convertech1995,23,25−29..
Naganuma,Y.;Horiuchi,T.;Kato,C.;Tanaka,S.Low-temperaturesynthesisofsilicacoatingonapoly(ethyleneterephthalate)filmfromperhydropolysilazaneusingvacuumultravioletlightirradiation.Surf. Coat. Technol.2013,225,40−46..
Zhang,Z.B.;Shao,Z.H.;Luo,Y.M.;An,P.Y.;Zhang,M.Y.;Xu,C.H.Hydrophobic,transparentandhardsiliconoxynitridecoatingfromperhydropolysilazane.Polym. Int.2015,64,971−978..
Niizeki,T.;Nagayama,S.;Hasegawa,Y.;Miyata,N.;Sahara,M.;Akutsu,K.Structuralstudyofsilicacoatingthinlayerspreparedfromperhydropolysilazane:substratedependenceandwaterpenetrationstructure.Coatings2016,6,64..
Zhang,Z.B.;Wang,D.;Xiao,F.Y.;Liang,Q.Y.;Luo,Y.M.;Xu,C.H.Dense,uniform,smoothSiO2/TiO2hardcoatingsderivedfromasingleprecursorsourceoftetra-nbutyltitanatemodifiedperhydropolysilazane.RSC Adv.2018,8,16746−16752..
Kamiya,K.;Tange,T.;Hashimoto,T.;Nasu,H.;Shimizu,H.Formationprocessofsilicaglassthinfilmsfromperhydropolysilazane.Research Reports of the Faculty of Engineering2001,26,23−32..
Nakajima,K.;Uchiyama,H.;Kitano,T.;Kozuka,H.Conversionofsolution-derivedperhydropolysilazanethinfilmsintosilicainbasichumidatmosphereatroomtemperature.J. Am. Ceram. Soc.2013,96,2806−2816..
Zhan,Y.;Grottenmuller,R.;Li,W.;Javaid,F.;Riedel,R.Evaluationofmechanicalpropertiesandhydrophobicityofroom-temperature,moisture-curablepolysilazanecoatings.J. Appl. Polym. Sci.2021,138,e50469..
Morlier,A.;Cros,S.;Garandet,J.P.;Alberola,N.Thingas-barriersilicalayersfromperhydropolysilazaneobtainedthroughlowtemperaturecurings:acomparativestudy.Thin Solid Films2012,524,62−66..
Prager,L.;Dierdorf,A.;Liebe,H.;Naumov,S.;Stojanovic,S.;Heller,R.;Wennrich,L.;Buchmeiser,M.R.ConversionofperhydropolysilazaneintoaSiOxnetworktriggeredbyvacuumultravioletirradiation:accesstoflexible,transparentbarriercoatings.Chem. Eur. J.2007,13,8522−8529..
Kubo,T.;Tadaoka,E.;Kozuka,H.Preparationofhotwater-resistantsilicathinfilmsfrompolysilazanesolutionatroomtemperature.J. Sol-gel Sci. Technol.2004,31,257−261..
Kubo,T.;Kozuka,H.Conversionofperhydropolysilazane-to-silicathinfilmsbyexposuretovaporfromaqueousammoniaatroomtemperature.J. Ceram. Soc. JAPAN2006,114,517−523..
Kozuka,H.;Fujita,M.;Tamoto,S.Polysilazaneasthesourceofsilica:theformationofdensesilicacoatingsatroomtemperatureandthenewroutetoorganic-inorganichybrids.J. Sol-gel Sci. Technol.2008,48,148−155..
Lee,J.S.;Oh,J.H.;Moon,S.W.;Sul,W.S.;KimS.D.ATechniqueforConvertingPerhydropolysilazanetoSiOxatLowTemperature.Electrochem. Solid ST.2010,13,H23−H25..
Jung,S.H.;Lee,J.S.;Oh,J.H.;Moon,S.W.;Kim,S.D.Methodoflow-temperatureconversionofpehydropolysilazaneintoamorphousSiOxinaqueoussolutions.Jpn. J. Appl. Phys.2010,49,111505..
Bauer,F.;Decker,U.;Dierdorf,A.;Ernst,H.;Heller,R.;Liebe,H.;Mehnert,R.Preparationofmoisturecurablepolysilazanecoatings.PartI.ElucidationoflowtemperaturecuringkineticsbyFT-IRspectroscopy.Prog. Org. Coat.2005,53,183−190..
Je,S.Y.;Son,B.G.;Kim,H.G.;Park,M.Y.;Do,L.M.;Choi,R.;Jeong,J.K.Solution-processableLaZrOx/SiO2gatedielectricatlowtemperatureof180°Cforhigh-performancemetaloxidefield-effecttransistors.ACS Appl. Mater. Interfaces2014,6,18693−18703..
Oliver,W.C.;Pharr,G.M.Animprovedtechniquefordetermininghardnessandelasticmodulususingloadanddisplacementsensingindentationexperiments.J. Mater. Res.1992,7,1564−1583..
Xu,D.S.;Sun,L.;Li,H.L.;Zhang,L.;Guo,G.L.;Zhao,X.S.;Gui,L.L.Hydrolysisandsilanizationofthehydrosiliconsurfaceoffreshlypreparedporoussiliconbyanaminecatalyticreaction.New J. Chem.2003,27,300−306..
Perera,D.Y.;Selier,P.Watertransportinorganiccoatings.Prog. Org. Coat.1973,2,57−80..
Chen,Q.;Zhang,X.S.;Wang,F.Experimentalstudyofthermaldiffusionenhancedvaportransferperformancewithperhydropolysilazane-derivedsilica(PDS)coatingmembranesinairdehumidificationprocess.Int. J. Refrig.2021,122,21−32..
Gunthner,M.;Wang,K.;Bordia,R.K.;Motz,G.Conversionbehaviourandresultingmechanicalpropertiesofpolysilazane-basedcoatings.J. Eur. Ceram. Soc.2012,32,1883−1892..
Muller,S.;deHazan,Y.;Penner,D.Effectoftemperature,humidityandaminoalkoxysilaneadditiveonthelowtemperaturecuringofpolyorganosilazanecoatingsstudiedbyIRspectroscopy,gravimetricandevolvedgasanalysis.Prog. Org. Coat.2016,97,133−145..
Kang,Y.H.;Min,B.K.;Kim,S.K.;Bae,G.;Song,W.;Lee,C.;Cho,S.Y.;An,K.S.Protonconductingperhydropolysilazane-derivedgatedielectricforsolution-processedmetaloxide-basedthin-filmtransistors.ACS Appl. Mater. Interfaces2020,12,15396−15405..
Iwamoto,Y.;Kikuta,K.I.;Hirano,S.I.Si3N4-TiN-Y2O3ceramicsderivedfromchemicallymodifiedperhydropolysilazane.J. Mater. Res.1999,14,4294−4301..
Lin,R.Y.;Carlstrom,G.;Pham,Q.D.;Anderson,M.W.;Topgaard,D.;Edler,K.J.;Alfredsson,V.Kineticinfluenceofsiliceousreactionsonstructureformationofmesoporoussilicaformedviatheco-structuredirectingagentroute.J. Phys. Chem. C2016,120,3814−3821..
Miloskovska,E.;Hansen,M.R.;Friedrich,C.;Hristova-Bogaerds,D.;vanDuin,M.;deWith,G.In situsilicananoparticleformationinarubbermatrixmonitoredviareal-timeSAXSandsolid-stateNMRspectroscopy.Macromolecules2014,47,5174-5185..
Yang,C.C.;Chen,W.C.Thestructuresandpropertiesofhydrogensilsesquioxane(HSQ)filmsproducedbythermalcuring.J. Mater. Chem.2002,12,1138−1141..
Nikitin,T.;Velagapudi,R.;Sainio,J.;Lahtinen,J.;Rasanen,M.;Novikov,S.;Khriachtchev,L.OpticalandstructuralpropertiesofSiOxfilmsgrownbymolecularbeamdeposition:effectoftheSiconcentrationandannealingtemperature.J. Appl. Phys.2012,112,094316..
https://henke.lbl.gov/optical_constants/asf.html.
Wang,L.M.;Li,Q.D.;Liu,S.J.;Cao,Z.X.;Cai,Y.P.;Jiao,X.C.;Lai,H.J.;Xie,W.G.;Zhan,X.Z.;Zhu,T.QuantitativedeterminationoftheverticalsegregationandmolecularorderingofPBDB-T/ITICblendfilmswithsolventadditives.ACS Appl. Mater. Interfaces2020,12,24165−24173..
Briscoe,B.J.;Fiori,L.;Pelillo,E.Nano-indentationofpolymericsurfaces.J. Phys. D1998,31,2395..
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