Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization

Xiao Yang; Yan-Fang Niu; Meng-Xiao Wei; Jun-Ning Zhang; Ke-Liang Liu; Xin Du; Zhong-Ze Gu

doi:10.1007/s10118-022-2802-5

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Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization

RESEARCH ARTICLE | Updated：2022-12-19

- Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization
- Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization
- 高分子科学（英文版） 2023年41卷第1期页码：67-74
- Affiliations：
  
  State Key Laboratory of Bioelectronics, School of Biological Science and Medical Engineering, Southeast University, Nanjing 210096, China
- Author bio：
  
  du.xin@seu.edu.cn (X.D.)
  gu@seu.edu.cn (Z.Z.G.)
- Funds：
  
  This work was financially supported by the National Natural Science Foundation of China (Nos. 22002015 and 52033002), the Fundamental Research Funding from Jiangsu Province (No. BK20211560) and the Fundamental Research Funds for the Central Universities (No. 2242018R20011).;Electronic supplementary information (ESI) is available free of charge in the online version of this article at http://doi.org/10.1007/s10118-022-2802-5.
- DOI：10.1007/s10118-022-2802-5
  中图分类号：
- 收稿：2022-03-30，
  
  修回：2022-5-10，
  
  录用：2022-6-10，
  
  网络首发：2022-09-10，
  
  纸质出版：2023-01-01
- Accepted：
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Yang, X.; Niu, Y. F.; Wei, M. X.; Zhang, J. N.; Liu, K. L.; Du, X.; Gu, Z. Z. Generating microstructures with highly variable mechanical performance using two-photon lithography and thiol-ene photopolymerization. Chinese J. Polym. Sci. 2023, 41, 67–74

Xiao Yang, Yan-Fang Niu, Meng-Xiao Wei, et al. Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization[J]. Chinese Journal of Polymer Science, 2023, 41(1): 67-74.
Yang, X.; Niu, Y. F.; Wei, M. X.; Zhang, J. N.; Liu, K. L.; Du, X.; Gu, Z. Z. Generating microstructures with highly variable mechanical performance using two-photon lithography and thiol-ene photopolymerization. Chinese J. Polym. Sci. 2023, 41, 67–74 DOI： 10.1007/s10118-022-2802-5.

Xiao Yang, Yan-Fang Niu, Meng-Xiao Wei, et al. Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization[J]. Chinese Journal of Polymer Science, 2023, 41(1): 67-74. DOI： 10.1007/s10118-022-2802-5.

摘要

We report a novel photoresist system with adjustable mechanical performance based on thiol-ene polymerization. With 350-fold exposure dose change

the stiffness of the thiol-ene photoresin reached more that 700-fold change compared to 14-fold of the conventional acrylate photoresin. We developed a photoresist for two-photon lithography based on our results.

Abstract

In this study

we investigate the effect of the exposure dose on the mechanical property of the photoresins generated with acrylate self-polymerization and thiol-ene polymerization. The results indicate that the mechanical performance of the thiol-ene photoresin is highly depended on the exposure dose during the solidification process. With 350-fold exposure dose change

the stiffness of the thiol-ene photoresin reached more that 700-fold change compare to 14-fold of the acrylate photoresin. We developed a TPL photoresist based on our results and show the capability to fabricate microstrucutres with high resolution and variable mechanical performances using this method.

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references

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