Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering

Hai-liang Huang; Guo-bin Yi; Xi-hong Zu; Ben-bin Zhong; Hong-sheng Luo

doi:10.1007/s10118-017-1914-9

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Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering

Papers | Updated：2021-02-18

- Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering
- Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering
- Chinese Journal of Polymer Science 2017年35卷第5期页码：623-630
- Affiliations：
  
  School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, China
- Author bio：
  
  Guo-bin Yi (易国斌), E-mail:ygb702@163.com
- Funds：
  
  This work was financially supported by the National Natural Science Foundation of China(51273048);This work was financially supported by the National Natural Science Foundation of China(51203025);Natural Science Foundation of Guangdong Province(S2012040007725)
- DOI：10.1007/s10118-017-1914-9
  中图分类号：
- 收稿：2016-09-20，
  
  修回：2016-10-18，
  
  录用：2016-10-18，
  
  纸质出版：2017-05-05
- Accepted：
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Hai-liang Huang, Guo-bin Yi, Xi-hong Zu, 等. Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering[J]. Chinese Journal of Polymer Science, 2017,35(5):623-630.

Hai-liang Huang, Guo-bin Yi, Xi-hong Zu, et al. Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering[J]. Chinese Journal of Polymer Science, 2017, 35(5): 623-630.
Hai-liang Huang, Guo-bin Yi, Xi-hong Zu, 等. Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering[J]. Chinese Journal of Polymer Science, 2017,35(5):623-630. DOI： 10.1007/s10118-017-1914-9.

Hai-liang Huang, Guo-bin Yi, Xi-hong Zu, et al. Patterning of Triblock Copolymer Film and Its Application for Surface-enhanced Raman Scattering[J]. Chinese Journal of Polymer Science, 2017, 35(5): 623-630. DOI： 10.1007/s10118-017-1914-9.

摘要

Abstract

In this paper

microphase behavior of an ABC triblock copolymer

polystyrene-block-poly (2-vinylpyridine)-blockpoly (ethylene oxide)

namely PS-

-P2VP-

-PEO

was systematically studied during spin-coating and solvent vapor annealing based on various parameters

including the types of the solvent

spin speed and thickness. The morphological features and the microdomain location of the different blocks were characterized by atomic force microscope (AFM) and high resolution transmission electron microscopy (HRTEM). With increasing thickness

the order-order transition from nanopores array to the pattern of nanostripes was observed due to microdomain coarsening. These processes of pattern transformation were based on the selectivity of toluene for different blocks and on the contact time between solvent molecules and the three blocks. This work provides different templates for preparation of gold nanoparticle array on silicon wafer

which can be adopted as an active surface-enhanced Raman scattering (SERS) substrate for poly (3-hexylthiophene) (P3HT).

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references

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