EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*

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EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*

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- EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*
- EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*
- 高分子科学（英文版） 1999年17卷第1期页码：43-48
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- 纸质出版：1999-02-20
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EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*[J]. 高分子科学（英文版）, 1999,17(1):43-48.

EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*[J]. 1999, 17(1): 43-48.
EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*[J]. 高分子科学（英文版）, 1999,17(1):43-48. DOI：

EFFECT OF ACIDITY ON ACID-SENSITIVE UV CURING SYSTEM*[J]. 1999, 17(1): 43-48. DOI：

摘要

By using diphenyliodonium salts with different counterions as photo acid generators (PAGs)

theeffect of acidity on ring-opening polymerization of epoxy monomers and polycondensation of polyol withhexamethoxymethyl melamine (HMMM) was studied. The result shows that the rate of ring-openingpolymerization is evidently dependent on the acidity of the acid and strong photo-generated acid is required.However

there is a leveling effect in the polycondensation system; if the photo-generated acid is stronger than protonated HMMM

the acidity does not obviously affect the polycondendation rate.

Abstract

By using diphenyliodonium salts with different counterions as photo acid generators (PAGs)

there is a leveling effect in the polycondensation system; if the photo-generated acid is stronger than protonated HMMM

the acidity does not obviously affect the polycondendation rate.

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