COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*

FANG Yuee; CHEN Dapeng; LIU Gang; WANG Bing; SHI Tianyi; HU Yiguan; TIAN Yangchao; KAN Ya

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COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*

Papers | Updated：2021-06-21

- COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
- COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
- 高分子科学（英文版） 1998年16卷第4期页码：304-309
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- 纸质出版：1998-12-20
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FANG Yuee, CHEN Dapeng, LIU Gang, 等. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. 高分子科学（英文版）, 1998,16(4):304-309.

FANG Yuee, CHEN Dapeng, LIU Gang, et al. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. 1998, 16(4): 304-309.
FANG Yuee, CHEN Dapeng, LIU Gang, 等. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. 高分子科学（英文版）, 1998,16(4):304-309. DOI：

FANG Yuee, CHEN Dapeng, LIU Gang, et al. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. 1998, 16(4): 304-309. DOI：

摘要

The copolymers of chloroethyl methacrylate (CMA)

glycidyl methacry-late (GMA)

and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3

respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm

respectively.

Abstract

The copolymers of chloroethyl methacrylate (CMA)

glycidyl methacry-late (GMA)

and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3

respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and0.17 ～0.2μm

respectively.

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