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Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker
RESEARCH ARTICLE | Updated:2026-03-26
    • Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker

    • Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker

    • Chinese Journal of Polymer Science   2026年44卷第4期 页码:937-949
    • DOI:10.1007/s10118-025-3496-2    

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    • 收稿:2025-10-10

      录用:2025-11-07

      网络首发:2026-01-22

      纸质出版:2026-04-05

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  • Wu, C. C.; Dong, J. F.; Chenchai, K. Y.; Chen, L. L.; Shi, T. Y.; Ma, J. L.; Li, Z. M.; Zhao, J. H.; Zang, H. J.; Zhang, G. X.; Zhang, D. Q. Efficient photo-patterning of polymer semiconductors with a four-armed diazo-based oligomer cross-linker. Chinese J. Polym. Sci. 2026, 44, 937–949 DOI: 10.1007/s10118-025-3496-2.

    Chang-Chun Wu, Jia-Feng Dong, Kai-Yuan Chenchai, et al. Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker[J]. Chinese Journal of Polymer Science, 2026, 44(4): 937-949. DOI: 10.1007/s10118-025-3496-2.

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