Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography

Ze-Qian Wang; Yi-Meng Wang; Xing-Yu Wang; Bing-Hua Wang; Jing-Bo Chen; Chang-Yu Shen; Bin Zhang

doi:10.1007/s10118-022-2709-1

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Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography

RESEARCH ARTICLE | Updated：2022-05-24

- Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography
- Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography
- Chinese Journal of Polymer Science 2022年40卷第6期页码：651-657
- Affiliations：
  
  1.School of Materials Science & Engineering, Zhengzhou University, Zhengzhou 450002, China
- Author bio：
  
  chenjb@zzu.edu.cn (J.B.C.)
  binzhang@zzu.edu.cn (B.Z.)
- Funds：
  
  This work was financially supported by the National Natural Science Foundation of China (Nos. 51973202, 51773182, U1804144, 52003247 and 11872338), the China Postdoctoral Science Foundation (No. 2020M682340), the Young Outstanding Teachers of University in Henan Province (No. 2019GGJS003), the Postdoctoral Research Grant in Henan Province (No. 201901009), and the Startup Research Fund of Zhengzhou University (No. 32211191).
- DOI：10.1007/s10118-022-2709-1
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Ze-Qian Wang, Yi-Meng Wang, Xing-Yu Wang, 等. Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography[J]. Chinese Journal of Polymer Science, 2022,40(6):651-657.

Ze-Qian Wang, Yi-Meng Wang, Xing-Yu Wang, et al. Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography[J]. Chinese Journal of Polymer Science, 2022,40(6):651-657.
Ze-Qian Wang, Yi-Meng Wang, Xing-Yu Wang, 等. Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography[J]. Chinese Journal of Polymer Science, 2022,40(6):651-657. DOI： 10.1007/s10118-022-2709-1.

Ze-Qian Wang, Yi-Meng Wang, Xing-Yu Wang, et al. Self-nucleation of Patterned Polymer Thin Films Defined by Soft Lithography[J]. Chinese Journal of Polymer Science, 2022,40(6):651-657. DOI： 10.1007/s10118-022-2709-1.

摘要

The periodic arrays of PEO-,b,-P2VP isolated single crystals of uniform size with simultaneously controllable number density and spatial distribution of nuclei were prepared by self-nucleation of patterned dendritic crystals.

Abstract

The nucleation of crystals is often a determining step in the phase transition of materials, but it remains a challenge to control the density and specific location of nuclei simultaneously. Here we fabricated the isolated single crystals of uniform size with controlled number density and spatial distribution by self-nucleation of patterned dendritic crystals. Imprint lithography creates the periodic void space on the surface of poly(ethylene oxide)-,b,-poly(2-vinyl pyridine) (PEO-,b,-P2VP) block copolymer thin films and provides spatial redistribution of polymers, leading to the preferential nucleation and subsequent oriented growth of dendrites in the periodic arrays of imprinted lines. The morphology and thermal stability of the patterned crystals can be adjusted by tuning embossing conditions (,e. g., temperature and pressure). Furthermore, in the self-nucleation technique, the annealing temperature and heating rate are used as the feedback parameters to map the number density and spatial distribution of regrown single crystals. Such PEO-,b,-P2VP crystalline pattern can be used as a versatile template for large-area manufacturing of selective metal patterns for electronic devices and other applications.

关键词

Keywords

Self-nucleationImprint lithographyAtomic force microscopyCrystallization patternSelective metal pattern

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