Effect of Ink Molecular Weights and Annealing Conditions on Molecular Transfer Printing

Yuan-Yuan Pang; Sheng-Xiang Ji

doi:10.1007/s10118-018-2056-4

Your Location：

Home >

Browse articles >

Effect of Ink Molecular Weights and Annealing Conditions on Molecular Transfer Printing

Articles | Updated：2021-02-18

- Effect of Ink Molecular Weights and Annealing Conditions on Molecular Transfer Printing
- Chinese Journal of Polymer Science Vol. 36, Issue 6, Pages: 697-702(2018)
- Affiliations：
  
  a.Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
  b.University of Chinese Academy of Sciences, Beijing 100049, China
- Author bio：
  
  Sheng-Xiang Ji, E-mail sji@ciac.ac.cn
- Funds：
- DOI：10.1007/s10118-018-2056-4
  CLC：
- Received：15 September 2017，
  
  Accepted：07 October 2017，
  
  Online First：30 January 2018，
  
  Published：2018-06
- Accepted：
Scan QR Code
Yuan-Yuan Pang, Sheng-Xiang Ji. Effect of Ink Molecular Weights and Annealing Conditions on Molecular Transfer Printing[J]. Chinese Journal of Polymer Science, 2018, 36(6): 697-702.
DOI：

Yuan-Yuan Pang, Sheng-Xiang Ji. Effect of Ink Molecular Weights and Annealing Conditions on Molecular Transfer Printing[J]. Chinese Journal of Polymer Science, 2018, 36(6): 697-702. DOI： 10.1007/s10118-018-2056-4.

摘要

Abstract

The molecular transfer printing (MTP) technique has been invented to fabricate chemical patterns with high fidelity using homopolymer inks. In this work

we systematically studied the effects of the molecular weights of homopolymer inks and transfer conditions on the MTP process. We explored a large range of molecular weights (~3.5-56 kg·mol

-1

) of hydroxyl-terminated polystyrene (PS-OH) and hydroxyl-terminated poly(methyl methacrylate) (PMMA-OH) in the MTP process

and found that the resulting chemical patterns on replicas from all five blends were functional and able to direct the assembly of films of the same blends. The transfer temperature and the film annealing sequences had an impact on the MTP process. MTP was sensitive to the transfer temperature and could only be performed within a certain temperature range

. higher than the glass transition temperature (

) of copolymers and lower than the rearrangement temperature of the assembled domains. Pre-organization of the blend films was also necessary for MTP since the preferential wetting of PMMA domains at the replica surface might result in the formation of a PMMA wetting layer to prevent the presentation of underlying chemical patterns to the replica surface.

关键词

Keywords

references

S. Ji , L. Wan , C. C. Liu , P. F. Nealey . Directed self-assembly of block copolymers on chemical patterns:a platform for nanofabrication . Prog. Polym. Sci. , 2016 . 54-55 76 - 127 . DOI: 10.1016/j.progpolymsci.2015.10.006 http://doi.org/10.1016/j.progpolymsci.2015.10.006 .

W. Li , M. Mueller . Directed self-assembly of block copolymers by chemical or topographical guiding patterns:optimizing molecular architecture, thin-film properties, and kinetics . Prog. Polym. Sci. , 2016 . 54-55 47 - 75 . DOI: 10.1016/j.progpolymsci.2015.10.008 http://doi.org/10.1016/j.progpolymsci.2015.10.008 .

P. A. R. Delgadillo , R. Gronheid , C. J. Thode , H. Wu , Y. Cao , M. Neisser , M. Somervell , K. Nafus , P. F. Nealey . Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment . J. Micro-nanolitho. Mems. Moems. , 2012 . 11 ( 3 ): 031302 DOI: 10.1117/1.JMM.11.3.031302 http://doi.org/10.1117/1.JMM.11.3.031302 .

N. Mojarad , J. Gobrecht , Y. Ekinci . Interference lithography at euv and soft X-ray wavelengths:principles, methods, and applications . Microelectron. Eng. , 2015 . 143 55 - 63 . DOI: 10.1016/j.mee.2015.03.047 http://doi.org/10.1016/j.mee.2015.03.047 .

S. Ji , C. C. Liu , G. Liu , P. F. Nealey . Molecular transfer printing using block copolymers . ACS Nano , 2010 . 4 ( 2 ): 599 - 609 . DOI: 10.1021/nn901342j http://doi.org/10.1021/nn901342j .

S. Ji , C. C. Liu , W. Liao , A. L. Fenske , G. S. W. Craig , P. F. Nealey . Domain orientation and grain coarsening in cylinder-forming poly(styrene- b -methyl methacrylate) films . Macromolecules , 2011 . 44 ( 11 ): 4291 - 4300 . DOI: 10.1021/ma2005734 http://doi.org/10.1021/ma2005734 .

S. Ji , U. Nagpal , W. Liao , C. C. Liu , J. J. de Pablo , P. F. Nealey . Three-dimensional directed assembly of block copolymers together with two-dimensional square and rectangular nanolithography . Adv. Mater. , 2011 . 23 ( 32 ): 3692 - 3697 . DOI: 10.1002/adma.v23.32 http://doi.org/10.1002/adma.v23.32 .

X. Jin , X. Zhang , L. Wan , P. F. Nealey , S. Ji . Fabrication of chemical patterns from graphoepitaxially assembled block copolymer films by molecular transfer printing . Polymer , 2014 . 55 ( 15 ): 3278 - 3283 . DOI: 10.1016/j.polymer.2014.05.040 http://doi.org/10.1016/j.polymer.2014.05.040 .

G. Liu , P. F. Nealey . Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing . Polymer , 2017 . 116 99 - 104 . DOI: 10.1016/j.polymer.2017.03.049 http://doi.org/10.1016/j.polymer.2017.03.049 .

M. S. Onses , C. J. Thode , C. C. Liu , S. Ji , P. L. Cook , F. J. Himpsel , P. F. Nealey . Site-specific placement of au nanoparticles on chemical nanopatterns prepared by molecular transfer printing using block-copolymer films . Adv. Funct. Mater. , 2011 . 21 ( 16 ): 3074 - 3082 . DOI: 10.1002/adfm.201100300 http://doi.org/10.1002/adfm.201100300 .

C. J. Thode , P. L. Cook , Y. Jiang , Onses M. Serdar , S. Ji , F. J. Himpsel , P. F. Nealey . In situ metallization of patterned polymer brushes created by molecular transfer print and fill . Nanotechnology , 2013 . 24 ( 15 ): 155602 DOI: 10.1088/0957-4484/24/15/155602 http://doi.org/10.1088/0957-4484/24/15/155602 .

M. S. Onses . Fabrication of nanopatterned poly(ethylene glycol) brushes by molecular transfer printing from poly(styreneblock-methyl methacrylate) films to generate arrays of Au nanoparticles . Langmuir , 2015 . 31 ( 3 ): 1225 - 1230 . DOI: 10.1021/la504359f http://doi.org/10.1021/la504359f .

T. Inoue , D. W. Janes , J. Ren , H. S. Suh , X. Chen , C. J. Ellison , P. F. Nealey . Molecular transfer printing of block copolymer patterns over large areas with conformal layers . Adv. Mater. Interfaces , 2015 . 2 ( 10 ): 1500133 DOI: 10.1002/admi.201500133 http://doi.org/10.1002/admi.201500133 .

H. H. Solak , C. David , J. Gobrecht , V. Golovkina , F. Cerrina , S. O. Kim , P. F. Nealey . Sub-50 nm period patterns with EUV interference lithography . Microelectron. Eng. , 2003 . 67-68 56 - 62 . DOI: 10.1016/S0167-9317(03)00059-5 http://doi.org/10.1016/S0167-9317(03)00059-5 .

J. Wang , J. H. Song , Y. Y. Lu , Y. J. Ruan , L. J. An . Phase behavior and interfacial properties of diblock copolymer-homopolymer ternary mixtures:influence of volume fraction of copolymers and interaction energy . Chinese J. Polym. Sci. , 2017 . 35 ( 7 ): 874 - 886 . DOI: 10.1007/s10118-017-1915-8 http://doi.org/10.1007/s10118-017-1915-8 .

X. Y. Wei , W. Y. Gu , X. B. Shen , J. Strzalka , Z. Jiang , T. P. Russell . Deviations from bulk morphologies in thin films of block copolymer/additive binary blends . Chinese J. Polym. Sci. , 2013 . 31 ( 9 ): 1250 - 1259 . DOI: 10.1007/s10118-013-1320-x http://doi.org/10.1007/s10118-013-1320-x .

X. S. Jin , Y. Y. Pang , S. X. Ji . From self-assembled monolayers to chemically patterned brushes:controlling the orientation of block copolymer domains in films by substrate modification . Chinese J. Polym. Sci. , 2016 . 34 ( 6 ): 659 - 678 . DOI: 10.1007/s10118-016-1800-x http://doi.org/10.1007/s10118-016-1800-x .

E. Han , I. In , S. M. Park , Y. H. La , Y. Wang , P. F. Nealey , P. Gopalan . Photopatternable imaging layers for controlling block copolymer microdomain orientation . Adv. Mater. , 2007 . 19 ( 24 ): 4448 - 4452 . DOI: 10.1002/(ISSN)1521-4095 http://doi.org/10.1002/(ISSN)1521-4095 .

I. In , Y. H. La , S. M. Park , P. F. Nealey , P. Gopalan . Side-chain-grafted random copolymer brushes as neutral surfaces for controlling the orientation of block copolymer microdomains in thin films . Langmuir , 2006 . 22 ( 18 ): 7855 - 7860 . DOI: 10.1021/la060748g http://doi.org/10.1021/la060748g .

S. Ji , W. Liao , P. F. Nealey . Block cooligomers:a generalized approach to controlling the wetting behavior of block copolymer thin films . Macromolecules , 2010 . 43 ( 16 ): 6919 - 6922 . DOI: 10.1021/ma1007946 http://doi.org/10.1021/ma1007946 .

S. Ji , C. C. Liu , J. G. Son , K. Gotrik , G. S. W. Craig , P. Gopalan , F. J. Himpsel , K. Char , P. F. Nealey . Generalization of the use of random copolymers to control the wetting behavior of block copolymer films . Macromolecules , 2008 . 41 ( 23 ): 9098 - 9103 . DOI: 10.1021/ma801861h http://doi.org/10.1021/ma801861h .

S. Ji , G. Liu , F. Zheng , G. S. W. Craig , F. J. Himpsel , P. F. Nealey . Preparation of neutral wetting brushes for block copolymer films from homopolymer blends . Adv. Mater. , 2008 . 20 ( 16 ): 3054 - 3060 . DOI: 10.1002/adma.v20:16 http://doi.org/10.1002/adma.v20:16 .

P. Mansky , Y. Liu , E. Huang , T. P. Russell , C. J. Hawker . Controlling polymer-surface interactions with random copolymer brushes . Science , 1997 . 275 ( 5305 ): 1458 - 1460 . DOI: 10.1126/science.275.5305.1458 http://doi.org/10.1126/science.275.5305.1458 .

Y. Pang , L. Wan , G. Huang , X. Zhang , X. Jin , P. Xu , Y. Liu , M. Han , G. P. Wu , S. Ji . Controlling block copolymersubstrate interactions by homopolymer brushes/mats . Macromolecules , 2017 . 50 ( 17 ): 6733 - 6741 . DOI: 10.1021/acs.macromol.7b00743 http://doi.org/10.1021/acs.macromol.7b00743 .

D. Y. Ryu , K. Shin , E. Drockenmuller , C. J. Hawker , T. P. Russell . A generalized approach to the modification of solid surfaces . Science , 2005 . 308 ( 5719 ): 236 - 239 . DOI: 10.1126/science.1106604 http://doi.org/10.1126/science.1106604 .

G. Liu , M. P. Stoykovich , S. Ji , K. O. Stuen , G. S. W. Craig , P. F. Nealey . Phase behavior and dimensional scaling of symmetric block copolymer-homopolymer ternary blends in thin films . Macromolecules , 2009 . 42 ( 8 ): 3063 - 3072 . DOI: 10.1021/ma802773h http://doi.org/10.1021/ma802773h .

S. O. Kim , H. H. Solak , M. P. Stoykovich , N. J. Ferrier , J. J. de Pablo , P. F. Nealey . Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates . Nature , 2003 . 424 ( 6947 ): 411 - 414 . DOI: 10.1038/nature01775 http://doi.org/10.1038/nature01775 .

M. P. Stoykovich , M. Muller , S. O. Kim , H. H. Solak , E. W. Edwards , J. J. de Pablo , P. F. Nealey . Directed assembly of block copolymer blends into nonregular device-oriented structures . Science , 2005 . 308 ( 5727 ): 1442 - 1446 . DOI: 10.1126/science.1111041 http://doi.org/10.1126/science.1111041 .

J. Y. Cheng , C. T. Rettner , D. P. Sanders , H. C. Kim , W. D. Hinsberg . Dense self-assembly on sparse chemical patterns:rectifying and multiplying lithographic patterns using block copolymers . Adv. Mater. , 2008 . 20 ( 16 ): 3155 - 3158 . DOI: 10.1002/adma.v20:16 http://doi.org/10.1002/adma.v20:16 .

R. Ruiz , H. Kang , F. A. Detcheverry , E. Dobisz , D. S. Kercher , T. R. Albrecht , J. J. de Pablo , P. F. Nealey . Density multiplication and improved lithography by directed block copolymer assembly . Science , 2008 . 321 ( 5891 ): 936 - 939 . DOI: 10.1126/science.1157626 http://doi.org/10.1126/science.1157626 .

G. Liu , C. S. Thomas , G. S. W. Craig , P. F. Nealey . Integration of density multiplication in the formation of device-oriented structures by directed assembly of block copolymer-homopolymer blends . Adv. Funct. Mater. , 2010 . 20 ( 8 ): 1251 - 1257 . DOI: 10.1002/adfm.v20:8 http://doi.org/10.1002/adfm.v20:8 .

C. C. Liu , A. Ramirez-Hernandez , E. Han , G. S. W. Craig , Y. Tada , H. Yoshida , H. Kang , S. Ji , P. Gopalan , J. J. de Pablo , P. F. Nealey . Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features . Macromolecules , 2013 . 46 ( 4 ): 1415 - 1424 . DOI: 10.1021/ma302464n http://doi.org/10.1021/ma302464n .

M. Stoykovich , E. Edwards , H. Solak , P. Nealey . Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces . Phys. Rev. Lett. , 2006 . 97 ( 14 ): 147802 DOI: 10.1103/PhysRevLett.97.147802 http://doi.org/10.1103/PhysRevLett.97.147802 .

E. W. Edwards , M. F. Montague , H. H. Solak , C. J. Hawker , P. F. Nealey . Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates . Adv. Mater. , 2004 . 16 ( 15 ): 1315 - 1319 . DOI: 10.1002/(ISSN)1521-4095 http://doi.org/10.1002/(ISSN)1521-4095 .

E. W. Edwards , M. Mueller , M. P. Stoykovich , H. H. Solak , J. J. de Pablo , P. F. Nealey . Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates . Macromolecules , 2007 . 40 ( 1 ): 90 - 96 . DOI: 10.1021/ma0607564 http://doi.org/10.1021/ma0607564 .

P. F. Green , E. J. Kramer . Temperature dependence of tracer diffusion coefficients in polystyrene . J. Mater. Res. , 1986 . 1 ( 1 ): 202 - 204 . DOI: 10.1557/JMR.1986.0202 http://doi.org/10.1557/JMR.1986.0202 .

A. M. Welander , H. Kang , K. O. Stuen , H. H. Solak , M. Mueller , J. J. de Pablo , P. F. Nealey . Rapid directed assembly of block copolymer films at elevated temperatures . Macromolecules , 2008 . 41 ( 8 ): 2759 - 2761 . DOI: 10.1021/ma800056s http://doi.org/10.1021/ma800056s .

Views

Downloads

CSCD

Alert me when the article has been cited

Submit

Tools

Publicity Resources

From Self-assembled Monolayers to Chemically Patterned Brushes: Controlling the Orientation of Block Copolymer Domains in Films by Substrate Modification

Core Structure Modulation of 2D Nanosheets by Selective Crystallization-driven Self-assembly of Polyhedral Oligomeric Silsesquioxane-containing Block Copolymers

Thermoplastic Liquid Crystal Elastomers Based on ABA-type Triblock Copolymers

Hydrophobicity Regulated Coacervate Droplet Size and the Thermal Protection Against Denaturation of Enzyme

Sequence-encoded Conformation Pathways in Viscoelastic Microphase Separation of Multiblock Copolymers

Related Author

Xiao-sa Jin

Cheng-Yang Hong

Kun Yu

Heng-Zhi You

Wei Tian

Qing-Yun Guo

Hao Liu

Heng-Hui Zhu

Related Institution

State Key Laboratory of Advanced Fiber Materials, Center for Advanced Low-Dimension Materials, College of Materials Science and Engineering, Donghua University

School of Chemistry and Chemical Engineering, Southeast University

School of Materials Science and Engineering, Tianjin Key Laboratory of Composite and Functional Materials, Tianjin University

Analysis and Measurement Center, Tianjin University

State Key Laboratory of Molecular Engineering of Polymers, Research Center of AI for Polymer Science, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University

⁰