UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO<sub>2</sub> Nanorods

Lin Qi; Yan-fen Ding; Quan-xiao Dong; Bin Wen; Peng Liu; Feng Wang; Shi-min Zhang; Ming-shu Yang

doi:10.1007/s10118-014-1472-3

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UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO₂ Nanorods

Updated：2021-06-21

- UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO₂ Nanorods
- Chinese Journal of Polymer Science Vol. 32, Issue 7, Pages: 834-843(2014)
- Affiliations：
  
  a.Beijing National Laboratory for Molecular Science, Key Laboratory of Engineering Plastics, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
  b.Beijing Engineering Research Center of Architectural Functional Macromolecular Materials, Beijing Building Construction Research Institute, Co., Ltd., Beijing 100039, China
- Author bio：
  
  **Ming-shu Yang (阳明书), E-mail: yms@iccas.ac.cn
- Funds：
- DOI：10.1007/s10118-014-1472-3
  CLC：
- Received：31 March 2014，
  
  Revised：2014-04-18，
  
  Accepted：21 April 2014，
  
  Published：2014-07
- Accepted：
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Lin Qi, Yan-fen Ding, Quan-xiao Dong, et al. UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO₂ Nanorods[J]. Chinese Journal of Polymer Science, 2014, 32(7): 834-843. DOI: 10.1007/s10118-014-1472-3.
DOI：

Lin Qi, Yan-fen Ding, Quan-xiao Dong, et al. UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO₂ Nanorods[J]. Chinese Journal of Polymer Science, 2014, 32(7): 834-843. DOI: 10.1007/s10118-014-1472-3. DOI：

摘要

Abstract

Surface modified rutile-type titanium dioxide (CST) nanorods were used as a UV absorber in polypropylene (PP) thick bars in combination with the hindered amine light stabilizer (HALS) Chimassorb

944 (C944). For all of the tested samples

the photodegradation was mainly limited in the region near the exposed surface

as proved by the carbonyl index and molecular weight. Compared with the typical HALS photostabilization system containing organic hindered phenol UV absorber Tinuvin

328 (T328)

the thickness of photodegradation region for PP/C944/CST was only a quarter to that for PP/C944 and PP/C944/T328

while the rates of reduction in molecular weight and increase in carbonyl index were much lower. Optical microscopic observation showed that the evolution of surface micro-cracks in PP/C944/CST was quite different from that in the other samples

while scanning electronic micrographs revealed that the depth of the micro-cracks in PP/C944/CST was much shorter than that in the others. It is therefore concluded that the protection of CST on PP thick bars is mainly attributed to the outstanding UV-shielding and cracks-blocking abilities.

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UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO2 Nanorods

DOI：10.1007/s10118-014-1472-3

摘要

Abstract

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UV Photodegradation of Polypropylene Thick Bars Containing Rutile-type TiO₂ Nanorods