COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
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COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
Vol. 16, Issue 4, Pages: 304-309(1998)
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Published:20 December 1998
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FANG Yuee, CHEN Dapeng, LIU Gang, et al. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. 1998, 16(4): 304-309.
DOI:
FANG Yuee, CHEN Dapeng, LIU Gang, et al. COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*[J]. 1998, 16(4): 304-309.DOI:
COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS*
and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3
respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1~0.16μm and0.17 ~0.2μm
respectively.
Abstract
The copolymers of chloroethyl methacrylate (CMA)
glycidyl methacry-late (GMA)
and methyl methacrylate (MMA) were synthesized in benzene solution. Theirbreadths of the molecular weight distributions are 2.1 and 2.3
respectively The ther-mal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutionsof P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1~0.16μm and0.17 ~0.2μm
respectively.
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