Polyethers could form hydroperoxide under air-oxidation or photo-oxidation in the presence of H2O2. The scission of ether linkage induced by moderate oxidation was prevented by controlling the reaction time and hydroperoxide concentration. The oxidation rate was affected by the end groups of polyethers. The decreasing order of oxidation rate for various poly(tetramethylene ether) glycol derivatives having different end groups are as follows: poly(tetramethylene ether) glycol (PTMG)>poly(tetramethylene ether) phenyl carbamate (ptmgpc).The urethane end groups in PTMGPC increase the resistance toward oxidation.Polyether hydroperoxide reacts with ferrous ion or N
N-dimethyl toluidine(DMT) to form polymericoxy radical which then initiates the graft copolymerization of vinyl monomers at low temperature
and was devoid of homopolymerization.The copolymer after separation and purification was proved to be a graft one by IR analysis and elemental analysis.
Abstract
Polyethers could form hydroperoxide under air-oxidation or photo-oxidation in the presence of H2O2. The scission of ether linkage induced by moderate oxidation was prevented by controlling the reaction time and hydroperoxide concentration. The oxidation rate was affected by the end groups of polyethers. The decreasing order of oxidation rate for various poly(tetramethylene ether) glycol derivatives having different end groups are as follows: poly(tetramethylene ether) glycol (PTMG)>poly(tetramethylene ether) phenyl carbamate (ptmgpc).The urethane end groups in PTMGPC increase the resistance toward oxidation.Polyether hydroperoxide reacts with ferrous ion or N
N-dimethyl toluidine(DMT) to form polymericoxy radical which then initiates the graft copolymerization of vinyl monomers at low temperature
and was devoid of homopolymerization.The copolymer after separation and purification was proved to be a graft one by IR analysis and elemental analysis.
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