Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker

Chang-Chun Wu; Jia-Feng Dong; Kai-Yuan Chenchai; Liang-Liang Chen; Tian-Yu Shi; Jun-Long Ma; Zi-Meng Li; Jian-Hong Zhao; Hong-Jun Zang; Guan-Xin Zhang; De-Qing Zhang

doi:10.1007/s10118-025-3496-2

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Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker

RESEARCH ARTICLE | Updated：2026-03-26

- Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker
- Chinese Journal of Polymer Science Vol. 44, Issue 4, Pages: 937-949(2026)
- Affiliations：
  
  a.State Key Laboratory of Hollow Fiber Membrane Materials and Processes, School of Chemistry, Tiangong University, Tianjin 300387, China
  b.Beijing National Laboratory for Molecular Sciences, Organic Solids Laboratory, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
- Author bio：
  
  dqzhang@iccas.ac.cn
- Funds：
- DOI：10.1007/s10118-025-3496-2
  CLC：
- Received：10 October 2025，
  
  Accepted：07 November 2025，
  
  Online First：22 January 2026，
  
  Published：05 April 2026
- Accepted：
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Wu, C. C.; Dong, J. F.; Chenchai, K. Y.; Chen, L. L.; Shi, T. Y.; Ma, J. L.; Li, Z. M.; Zhao, J. H.; Zang, H. J.; Zhang, G. X.; Zhang, D. Q. Efficient photo-patterning of polymer semiconductors with a four-armed diazo-based oligomer cross-linker. Chinese J. Polym. Sci. 2026, 44, 937–949

Chang-Chun Wu, Jia-Feng Dong, Kai-Yuan Chenchai, et al. Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker[J]. Chinese Journal of Polymer Science, 2026, 44(4): 937-949.
Wu, C. C.; Dong, J. F.; Chenchai, K. Y.; Chen, L. L.; Shi, T. Y.; Ma, J. L.; Li, Z. M.; Zhao, J. H.; Zang, H. J.; Zhang, G. X.; Zhang, D. Q. Efficient photo-patterning of polymer semiconductors with a four-armed diazo-based oligomer cross-linker. Chinese J. Polym. Sci. 2026, 44, 937–949 DOI： 10.1007/s10118-025-3496-2.

Chang-Chun Wu, Jia-Feng Dong, Kai-Yuan Chenchai, et al. Efficient Photo-patterning of Polymer Semiconductors with a Four-armed Diazo-based Oligomer Cross-linker[J]. Chinese Journal of Polymer Science, 2026, 44(4): 937-949. DOI： 10.1007/s10118-025-3496-2.

摘要

A four-armed diazo-based oligomer photo-crosslinker

2DPP4N

was synthesized and utilized for efficient patterning of semiconducting polymers. Various patterns with feature sizes as small as 6 μm were prepared after 254 nm UV irradiation for 160 s. The charge mobility of the patterned thin film was largely maintained.

Abstract

Efficient photo-patterning of polymer semiconductors with cross-linkers has emerged as a promising route to fabricate organic integrated circuits

via

all-solution processing techniques. Herein

we report a new four-armed diazo-based oligomer photo-crosslinker

2DPP4N

for the patterning of semiconducting polymers by UV light-induced crossing-linking reaction. After blending

2DPP4N

with polymer semiconductors such as

PDPP4T

(p-type)

PDPP3T

(ambipolar) and

N2200

(n-type)

we prepared various patterns with a resolution of 6 μm by irradiating through a photo-mask with 254 nm UV light for 160 s. Notably

the interchain packing and surface morphology remained nearly unchanged after photo-patterning

as characterized by atomic force microscopy (AFM) and grazing incidence wide-angle X-ray scattering (GIWAXS). Consequently

the charge transport property of the patterned thin film was largely maintained in comparison to that of its pristi

ne thin film. These results reveal that

2DPP4N

is a viable and promising candidate for application in all-solution-processable flexible integrated electronic devices.

关键词

Keywords

references

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