Fan, W. J.; Xie, M.; Tian, J. F.; He, Y.; Xia, S.; Fu, W. X. Topological design of low dielectric ladder-like polysilsesquioxane and copolymers. Chinese J. Polym. Sci. 2025, 43, 477–487
Wen-Jie Fan, Meng Xie, Jin-Feng Tian, et al. Topological Design of Low Dielectric Ladder-like Polysilsesquioxane and Copolymers[J]. Chinese Journal of Polymer Science, 2025, 43(3): 477-487.
Fan, W. J.; Xie, M.; Tian, J. F.; He, Y.; Xia, S.; Fu, W. X. Topological design of low dielectric ladder-like polysilsesquioxane and copolymers. Chinese J. Polym. Sci. 2025, 43, 477–487DOI: 10.1007/s10118-025-3296-8.
Wen-Jie Fan, Meng Xie, Jin-Feng Tian, et al. Topological Design of Low Dielectric Ladder-like Polysilsesquioxane and Copolymers[J]. Chinese Journal of Polymer Science, 2025, 43(3): 477-487.DOI: 10.1007/s10118-025-3296-8.
Topological Design of Low Dielectric Ladder-like Polysilsesquioxane and Copolymers
We present a topological design approach for ladder-like polysilsesquioxanes and copolymers. The cured materials exhibit excellent dielectric properties (
D
k
<
3.0
D
f
<
10
−2
)
superior thermal stability (
T
d5
>
453 °C)
reduced water absorption (from 0.33 wt% to 0.06 wt%) and enhanced mechanical properties.
Abstract
Low dielectric constant (low-
k
) materials are critical for advanced packaging in high-density microelectronic devices and high-frequency communication technologies. Ladder polysiloxanes
which are characterized by their unique double-chain structure and intrinsic microporosity
offer remarkable advantages in terms of thermal stability
oxidation resistance
and dielectric performance. However
structural defects in ladder polysiloxanes
such as cage-like and irregular oligomers
and their effects on dielectric properties remain underexplored. In this study
a series of ladder-like polysiloxanes (
X-TMS
) with diverse side groups weresynthesized
via
a one-step base-catalyzed method. The influence of the benzocyclobutene (BCB) side groups on the formation of regular ladder structures was systematically investigated. Notably
BCB incorporation disrupted the structural regularity
favoring the formation of cage-like and irregular topologies
which were extensively characterized using
29
silicon nuclear magnetic resonance spectroscopy (
29
Si-NMR)
Fourier transform infrared spectroscopy (FTIR)
gel permeation chromatography (GPC)
and X-ray diffraction (XRD). These structural defects were beneficial for improving the hydrophobicity and thermal stability. Copolymerization of X-TMS with commercial DVS-BCB resins further enhanced the mechanical properties
with the elastic modulus increasing from 3.6 GPa to 4.4 GPa and water absorption reduced from 0.33 wt% to 0.06 wt%. This study establishes a clear correlation between topological structures and material properties. These findings not only advance the un
derstanding of the structure-property relationships in ladder polysiloxanes but also provide a novel approach for designing high-performance interlayer dielectric materials for next-generation microelectronics.
关键词
Keywords
references
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