

FOLLOWUS
a.School of Materials Science and Engineering, Tongji University, Shanghai 201804, China
b.Institut de Science des Matériaux de Mulhouse, UMR CNRS 7361, Université de Haute-Alsace, 15 rue Jean Starcky, 68057 Mulhouse, France
Ming Jin (金明), E-mail:mingjin@tongji.edu.cn
Received:24 June 2016,
Revised:2016-8-12,
Accepted:12 August 2016,
Published:2016-12
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Xing-yu Wu, Jin Ming, Jian-chao Xie, et al. Effects of Conjugated Systems on UV-Visible Light-sensitive D-
A series of D-
π
-A type sulfonium salt photoacid generators with different
π
-conjugated structures
such as triphenyl
phenylstilbene
styryl-biphenyl
and stilbene
were designed to determine the effect of molecular structures on the photochemical and photophysical properties. The mechanisms of photochemical generation of H
+
were studied by UV-Vis spectroscopy
theoretical calculations
and fluorescence spectroscopy. It is found that the frontier orbits determine the absorption
the molar extinction coefficients
and the quantum yields of photoacid generation. Triphenyl systems connected with sulfonium are beneficial to increase the quantum yields of acid generation. The photoreactivity of four sulfonium salts was further evaluated through the polymerizations of various epoxide monomers at different irradiation wavelengths (365-425 nm) by using the real-time infrared spectroscopy with light-emitting diodes. The high quantum yields for acid generation (
Φ
H
+
=~0.32 to 0.58) and the high molar extinction coefficients (
ε
=~23500 L·mol
-1
·cm
-1
to 31000 L·mol
-1
·cm
-1
) of the sulfonium salts lead to high conversion rates (over 50%-80%). Hence
these photoinitiators exhibit potential for the photocuring applications.
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